rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Metrology, inspection, and process control for microlithography XII
    sub title: 23-25 February 1998, Santa Clara, California
  title info:
    title: Metrology, inspection and process control for microlithography twelve
  title info:
    title: Metrology, inspection and process control for microlithography 12
  name:
    name part: Singh, Bhanwar.
  name:
    name part: Society of Photo-optical Instrumentation Engineers
  name:
    name part: Semiconductor Equipment and Materials International
  name:
    name part: SEMATECH (Organization)
  type of resource: text
  genre: conference publication
  origin info:
    place:
      place term: wau
    date issued: 1998
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: xv, 744 pages : illustrations ; 28 cm.
  note: Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
  note: Includes bibliographical references and index.
  subject:
    topic: Integrated circuits
    topic: Inspection
    topic: Congresses
  subject:
    topic: Integrated circuits
    topic: Measurement
    topic: Congresses
  subject:
    topic: Microlithography
    genre: Congresses
  subject:
    topic: Process control
    genre: Congresses
  related item:
    title info:
      title: Proceedings of SPIE--the International Society for Optical Engineering ; v. 3332
  identifier: 0819427772
  record info:
    record content source: CUS
    record creation date: 980701
    record change date: 20151020084037.0
    record identifier: in00001423847