http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
Metrology, inspection, and process control for microlithography XII
23-25 February 1998, Santa Clara, California
Metrology, inspection and process control for microlithography twelve
Metrology, inspection and process control for microlithography 12
Society of Photo-optical Instrumentation Engineers
Semiconductor Equipment and Materials International
Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
Includes bibliographical references and index.
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3332