http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
17th Annual Symposium on Photomask Technology and Management
[proceedings] : 17-19 September, 1997, Redwood City, California
Symposium on Photomask Technology and Management 1997 : Redwood City, California)
Society of Photo-optical Instrumentation Engineers
James A. Reynolds, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology ; published by SPIE--the International Society for Optical Engineering.
Includes bibliographical references and index.
Proceedings of SPIE--the International Society for Optical Engineering ; v. 3236