17th Annual Symposium on Photomask Technology and Management : [proceedings] : 17-19 September, 1997, Redwood City, California /
| Corporate Authors: | , , |
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| Other Authors: | , |
| Format: | Conference Proceeding Book |
| Language: | English |
| Published: |
Bellingham, Washington :
SPIE,
[1998]
|
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 3236. |
| Subjects: |
| Physical Description: | ix, 554 pages : illustrations ; 28 cm. |
|---|---|
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819426695 |