Vapor Pressure measurements for dichlorosilane /
about the vapor pressure is necessary in the production of
| Main Author: | |
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| Format: | Thesis eBook |
| Language: | English |
| Published: |
[Place of publication not identified] :
[publisher not identified] ;
1997.
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| Subjects: | |
| Online Access: | Link to OAKTrust copy |
| Summary: | about the vapor pressure is necessary in the production of benefit of future studies. completion, thereby making difficult a quantitative analysis In the processing of silicon-based materials, such as those intermediate procedures to give an overall view of the isochoric method in the Thermodynamics Research Laboratory at key initial components is dichlorosilane. Dichlorosilane is measurements for dichlorosilane have been performed by the of the accuracy of the measurements. Vapor pressure often used in mixtures that include other pure silanes, like problems and solutions have also been given attention for the process, not just the data analysis and results. Common purchase of the dichlorosilane through the disposal of the Texas A&M University. Details have been provided from the that are available, there is little or no discussion about the methods employed from the start of the process through these mixtures. Measurements reported previously for the trichlorosilane and silicon tetrachloride, or other chemicals used for electronic and photovoltaic materials, one of the vapor pressure of pure dichlorosilane are sparse. For those waste product. Care has been taken to address all of the which are not in the silane family. Accurate information |
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| Item Description: | "Major subject: Mechanical Engineering". Vita. |
| Physical Description: | ix, 87 leaves : illustrations ; 28 cm. Also available online. Issued also on microfiche from Lange Micrographics. |
| Bibliography: | Includes bibliographical references. |