Study of utilizing static photoelastic effect in integrated optical devices /

Channel waveguides have been produced in LiNbO 39 LiTaO3,

Bibliographic Details
Main Author: Tang, Zhi-Cheng, 1964-
Format: Thesis Book
Language:English
Published: [Place of publication not identified] : [publisher not identified] ; 1994.
Subjects:
Online Access:http://proxy.library.tamu.edu/login?url=http://proquest.umi.com/pqdweb?did=742464811&sid=1&Fmt=2&clientId=2945&RQT=309&VName=PQD
Description
Summary:Channel waveguides have been produced in LiNbO 39 LiTaO3,
BaTiO3' and BSTN feffoelectric crystals by depositing thick
SiO2 films at an elevated temperature and patterning them by
combination of reactive ion etching and wet etching.
Propagation losses of 0.8 dB/cm and 0.9 dB/cm for TE- and TM-
polarization, respectively, were achieved for LiNbO3 at 0.633
lim wavelength, while insertion losses of 8.4 dB and 3.4 dB
for TE- and TM- polarization, respectively, were obtained for
a waveguide in z-cut BSTN of 5 mm in length at 1.3 [ ] m
wavelength. Electrooptic modulations have been demonstrated
for LiNbO3 using coplanar electrodes and for BSTN using both
coplanar and vertical electrodes. Tunable guided-wave TE<-
>TM mode converters with 98% efficiency have been obtained
using a periodic, strain inducing SiO2 film on a zinc
indiffused LiTaO3 waveguide. The conversion is highly
wavelength selective, with a spectral width of 9 nm in a
device with interactive length of 5.4 mm. Thermal and
electro-optic tuning of the center wavelength were
demonstrated. A polarizationindependent electrooptically
tunable wavelength filter using passive polarization
splatters and strain-induced polarization mode couplers in
LiTaO3 has also been realized. Tuning of the center
wavelength from 655 nm to 692 nm was demonstrated. An
optical bandwidth (FWHM) of 11 nm and a tuning rate of 0.4
nm/V were obtained.
Item Description:Vita.
"Major Subject: Electrical Engineering".
Physical Description:x, 86 leaves : illustrations ; 28 cm.
Issued also on microfiche from University Microfilms Inc.
Bibliography:Includes bibliographical references.