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Kinetics and characterization of tungsten CVD processes /

Bibliographic Details
Main Author: Ammerlaan, Johannes Andreas Maria
Format: Thesis Book
Language:English
Published: Delft : Delft University Press, [1994]
Subjects:
Chemical vapor deposition.
Tungsten.
Metallic films.
Semiconductor films.
Description
Item Description:Summary, postscript and vita in Dutch.
Physical Description:172 pages : illustrations ; 24 cm.
Bibliography:Includes bibliographical references.
ISBN:9062759610