14th Annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California /
| Corporate Authors: | , |
|---|---|
| Format: | Conference Proceeding Book |
| Language: | English |
| Published: |
Bellingham, Wash. :
SPIE--the International Society for Optical Engineering,
[1994]
|
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 2322. |
| Subjects: |
| Physical Description: | vii, 454 pages : illustrations ; 28 cm. |
|---|---|
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819416533 |