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13th Annual Symposium on Photomask Technology and Management : proceedings : 22-23 September 1993, Santa Clara, California /

Bibliographic Details
Corporate Authors:	Symposium on Photomask Technology and Management Santa Clara, Calif., BACUS (Technical group)
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash. : SPIE--the International Society for Optical Engineering, [1994]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 2087.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses.

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