13th Annual Symposium on Photomask Technology and Management : proceedings : 22-23 September 1993, Santa Clara, California /
| Corporate Authors: | , |
|---|---|
| Format: | Conference Proceeding Book |
| Language: | English |
| Published: |
Bellingham, Wash. :
SPIE--the International Society for Optical Engineering,
[1994]
|
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 2087. |
| Subjects: |
| Physical Description: | ix, 422 pages : illustrations ; 28 cm. |
|---|---|
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819413569 (pbk.) |