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Hydrogenated amorphous silicon alloy deposition processes /

Bibliographic Details
Main Author: Luft, Werner
Other Authors: Tsuo, Y. Simon
Format: Book
Language:English
Published: New York : M. Dekker, [1993]
Series:Applied physics series (Marcel Dekker, Inc.) ; 1.
Subjects:
Thin film devices > Design and construction.
Silicon alloys.
Plasma-enhanced chemical vapor deposition.
Thin films > Optical properties.
Thin films > Electric properties.
Description
Physical Description:xiv, 327 pages : illustrations ; 24 cm.
Bibliography:Includes bibliographical references (pages 243-316) and index.
ISBN:0824791460 (acid-free paper)