rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Chemical vapor deposition
    sub title: principles and applications
  name:
    name part: Hitchman, Michael L.
  name:
    name part: Jensen, Klavs F.
    name part: 1952-
  type of resource: text
  genre: bibliography
  origin info:
    place:
      place term: enk
    date issued: 1993
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: v, 677 pages : illustrations ; 24 cm.
  note: edited by Michael L. Hitchman and Klavs F. Jensen.
  note: Includes bibliographical references and index.
  subject:
    topic: Chemical vapor deposition
  classification: TS695 .C54 1993
  classification: 620/.44
  identifier: 0123496705
  identifier: 9780123496706
  identifier: 93125773
  identifier: http://www.loc.gov/catdir/toc/els032/93125773.html
  identifier: http://www.loc.gov/catdir/description/els032/93125773.html
  related item:
    location:
      url: http://www.loc.gov/catdir/toc/els032/93125773.html
  related item:
    location:
      url: http://www.loc.gov/catdir/description/els032/93125773.html
  record info:
    record content source: VPI
    record creation date: 930428
    record change date: 20150930084809.0
    record identifier: in00001137834