rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III
    sub title: 1-2 March 1993, San Jose, California
  title info:
    title: Electron-beam, X-ray and ion-beam submicrometer lithographies for manufacturing three
  title info:
    title: Electron-beam, X-ray and ion-beam submicrometer lithographies for manufacturing 3
  name:
    name part: Patterson, David O.
  name:
    name part: Society of Photo-optical Instrumentation Engineers
  type of resource: text
  genre: bibliography
  genre: conference publication
  origin info:
    place:
      place term: wau
    date issued: 1993
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: vii, 470 pages : illustrations ; 28 cm.
  note: David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
  note: Includes bibliographical references and index.
  subject:
    topic: Lithography, Electron beam
    genre: Congresses
  subject:
    topic: X-ray lithography
    genre: Congresses
  subject:
    topic: Ion beam lithography
    topic: Congresses
  subject:
    topic: Semiconductors
    topic: Etching
    genre: Congresses
  subject:
    topic: Masks (Electronics)
    genre: Congresses
  related item:
    title info:
      title: Proceedings of SPIE--the International Society for Optical Engineering ; v. 1924
  identifier: 0819411582 (pbk.)
  identifier: 93084071
  identifier: https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/1924.toc
  related item:
    location:
      url: https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/1924.toc
  record info:
    record content source: SRQ
    record creation date: 930729
    record change date: 20230427225527.7
    record identifier: in00001133800