Cover Image

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Patterson, David O.
Format: Book
Language:English
Published: Bellingham, Wash. : The Society, [1993]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 1924.
Subjects:
Lithography, Electron beam > Congresses.
X-ray lithography > Congresses.
Ion beam lithography > Congresses.
Semiconductors > Etching > Congresses.
Masks (Electronics) > Congresses.
Online Access:https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/1924.toc
Description
Physical Description:vii, 470 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819411582 (pbk.)