Society of Photo-optical Instrumentation Engineers & Patterson, D. O. (1993). Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III: 1-2 March 1993, San Jose, California. The Society.
Chicago Style (17th ed.) CitationSociety of Photo-optical Instrumentation Engineers and David O. Patterson. Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing III: 1-2 March 1993, San Jose, California. Bellingham, Wash.: The Society, 1993.
MLA (9th ed.) CitationSociety of Photo-optical Instrumentation Engineers and David O. Patterson. Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing III: 1-2 March 1993, San Jose, California. The Society, 1993.
Warning: These citations may not always be 100% accurate.