Cover Image

Resists in microlithography and printing /

Bibliographic Details
Main Author: Bednář, B.
Other Authors: Králíček, Jaroslav, Zachoval, Jaromír
Format: Book
Language:English
Published: Amsterdam ; New York : Elsevier, 1993.
Edition:2nd rev. ed.
Series:Materials science monographs ; 76.
Subjects:
Semiconductors > Design and construction.
Integrated circuits > Very large scale integration > Design and construction.
Microlithography.
X-ray lithography.
Lithography, Electron beam.
Description
Item Description:Translation of: Litografické techniky.
Physical Description:376 pages : illustrations
Bibliography:Includes bibliographical references and index.
ISBN:0444988467