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Advances in resist technology and processing IX : 9-10 March, 1992, San Jose, California /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Conference on Advances in Resist Technology and Processing
Other Authors:	Novembre, Anthony E.
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE, [1992]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 1672.
Subjects:	Photoresistors > Congresses. Photoresists > Congresses.

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