Advances in resist technology and processing IX : 9-10 March, 1992, San Jose, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Conference on Advances in Resist Technology and Processing
Other Authors: Novembre, Anthony E.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1992]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 1672.
Subjects:

MARC

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245 0 0 |a Advances in resist technology and processing IX :  |b 9-10 March, 1992, San Jose, California /  |c Anthony E. Novembre, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering. 
264 1 |a Bellingham, Wash., USA :  |b SPIE,  |c [1992] 
264 4 |c ©1992 
300 |a xi, 684 pages :  |b illustrations ;  |c 28 cm. 
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490 1 |a Proceedings / SPIE--the international society for optical engineering ;  |v v. 1672 
500 |a "The papers contained within this proceedings were presented at the ninth conference on Advances in Resist Technology and Processing, held as part of the 1992 SPIE Symposium on Microlithography."--P. xi. 
504 |a Includes bibliographical references and index. 
650 0 |a Photoresistors  |x Congresses. 
650 0 |a Photoresists  |v Congresses. 
700 1 |a Novembre, Anthony E. 
710 2 |a Society of Photo-optical Instrumentation Engineers. 
711 2 |a Conference on Advances in Resist Technology and Processing  |n ( (9th :  |d 1992 :  |c San Jose, Calif.) 
740 0 |a Advances in resist technology and processing nine. 
740 0 |a Advances in resist technology and processing 9. 
830 0 |a Proceedings of SPIE--the International Society for Optical Engineering ;  |v v. 1672. 
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