Advances in resist technology and processing IX : 9-10 March, 1992, San Jose, California /
| Corporate Authors: | , |
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| Other Authors: | |
| Format: | Conference Proceeding Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE,
[1992]
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 1672. |
| Subjects: |
| Item Description: | "The papers contained within this proceedings were presented at the ninth conference on Advances in Resist Technology and Processing, held as part of the 1992 SPIE Symposium on Microlithography."--P. xi. |
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| Physical Description: | xi, 684 pages : illustrations ; 28 cm. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819408271 |