Cover Image

11th annual Symposium on Photomask Technology : September 25-27, 1991, Sunnyvale, California /

Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Sunnyvale, Calif., Society of Photo-optical Instrumentation Engineers
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1992]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 1604.
Subjects:
Masks (Electronics) > Congresses.
Microlithography > Congresses.
Description
Physical Description:vii, 348 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:081940733X (pbk.)