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10th Annual Symposium on Microlithography : proceedings : September 26-27, 1990, Sunnyvale Hilton, Sunnyvale, California /

Bibliographic Details
Corporate Authors: Symposium on Microlithography Sunnyvale, Calif., BACUS International (Firm)
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1991]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; 1496.
Subjects:
Semiconductors > Congresses.
Microlithography > Congresses.
Masks (Electronics) > Congresses.
Description
Physical Description:v, 315 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819406058