Advanced x-ray/EUV radiation sources and applications : 11-13 July 1990, San Diego, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, International Symposium on Optical & Optoelectronic Applied Science & Engineering
Other Authors: Knauer, James Philip, Shenoy, G. K.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1990]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 1345.
Subjects:
Online Access:https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/1345.toc
Description
Item Description:"Part of a three-conference program on x-ray and EUV technologies held at the SPIE's International Symposium on Optical and Optoelectronic Applied Science and Engineering, 8-13 July 1990, San Diego, California."--P. v.
Physical Description:vii, 289 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819404063 (pbk.)