Advances in resist technology and processing V : 29 February-2 March, 1988, Santa Clara, California /
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| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE--the International Society for Optical Engineering,
[1988]
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 920. |
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| Physical Description: | viii, 449 pages : illustrations ; 28 cm. |
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| Bibliography: | Includes bibliographies and index. |
| ISBN: | 0892529555 (pbk.) |