Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California /
| Corporate Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Conference Proceeding Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE,
[1989]
|
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 1089. |
| Subjects: |
| Item Description: | Proceedings of the SPIE Symposium on Microlithography. |
|---|---|
| Physical Description: | viii, 388 pages : illustrations ; 28 cm. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819401242 |