rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Handbook of plasma processing technology
    sub title: fundamentals, etching, deposition, and surface interactions
  name:
    name part: Rossnagel, Stephen M.
  name:
    name part: Cuomo, J. J.
  name:
    name part: Westwood, William D. (William Dickson)
    name part: 1937-
  type of resource: text
  genre: bibliography
  origin info:
    place:
      place term: nju
    date issued: 1990
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: xxiii, 523 pages : illustrations ; 25 cm
  note: edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
  note: Includes bibliographical references and index.
  subject:
    topic: Plasma engineering
  subject:
    topic: Semiconductors
    topic: Etching
  subject:
    topic: Plasma etching
  classification: TA2020 .H37 1990
  classification: 621.044
  related item:
    title info:
      title: Materials science and process technology series
  identifier: 0815512201 :
  identifier: 89022834
  record info:
    record content source: DLC
    record creation date: 890809
    record change date: 20150924142721.0
    record identifier: in00000908885