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Selective and non-selective reactive ion etching of gallium arsenide and aluminum gallium arsenide /

Bibliographic Details
Main Author:	Yost, Dennis J.
Format:	Thesis Book
Language:	English
Published:	[Place of publication not identified] : [publisher not identified] ; 1989.
Subjects:	Gallium arsenide semiconductors. Semiconductors > Etching. Plasma etching. Major electrical engineering.

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