Cover Image

Semiconductor microlithography V /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Northern California Microphotomask/Masking Working Group, International Society for Hybrid Microelectronics
Other Authors: Dey, Jim
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE, [1980]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 221.
Subjects:
Semiconductors > Congresses.
Photolithography > Congresses.
Description
Physical Description:viii, 204 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and indexes.
ISBN:089252250X (pbk.)