Society of Photo-optical Instrumentation Engineers, Northern California Microphotomask/Masking Working Group, International Society for Hybrid Microelectronics, & Dey, J. (1980). Semiconductor microlithography V. SPIE.
Chicago Style (17th ed.) CitationSociety of Photo-optical Instrumentation Engineers, Northern California Microphotomask/Masking Working Group, International Society for Hybrid Microelectronics, and Jim Dey. Semiconductor Microlithography V. Bellingham, Wash.: SPIE, 1980.
MLA (9th ed.) CitationSociety of Photo-optical Instrumentation Engineers, et al. Semiconductor Microlithography V. SPIE, 1980.
Warning: These citations may not always be 100% accurate.