rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Glow discharge processes
    sub title: sputtering and plasma etching
  title info:
    title: Plasma etching
  name:
    name part: Chapman, Brian N.
    role:
      role term: creator
  type of resource: text
  genre: bibliography
  origin info:
    place:
      place term: nyu
    date issued: 1980
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: xv, 406 pages : illustrations ; 24 cm.
  note: Brian Chapman.
  note: "A Wiley-Interscience publication."
  note: Includes index.
  note: Bibliography: pages 397-400.
  subject:
    topic: Sputtering (Physics)
  subject:
    topic: Glow discharges
  classification: QC702.7.P6 C48
  classification: 537.5/2
  identifier: 047107828X :
  identifier: 80017047
  record info:
    record content source: DLC
    record creation date: 800514
    record change date: 20151015065000.0
    record identifier: in00000646757