Cover Image

Developments in semiconductor microlithography III, april 10-11, 1978, San Jose, California /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Ruddell, Richard L.
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE, [1978]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 135.
Subjects:
Semiconductors > Congresses.
Photolithography > Congresses.
Microelectronics > Congresses.
Description
Physical Description:vi, 170 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and indexes.
ISBN:0892521627