Cover Image

Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Northern California Microphotomask/Masking Working Group, International Society for Hybrid Microelectronics
Other Authors: Giffin, James W., Ruff, Bruce
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE, [1977]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 100.
Subjects:
Semiconductors > Congresses.
Photolithography > Congresses.
Microelectronics > Congresses.
Description
Physical Description:viii, 176 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and indexes.
ISBN:0892521279