APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Northern California Microphotomask/Masking Working Group, International Society for Hybrid Microelectronics, Giffin, J. W., & Ruff, B. (1977). Developments in semiconductor microlithography II: [seminar], April 4-5, 1977, San Jose, California. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Northern California Microphotomask/Masking Working Group, International Society for Hybrid Microelectronics, James W. Giffin, and Bruce Ruff. Developments in Semiconductor Microlithography II: [seminar], April 4-5, 1977, San Jose, California. Bellingham, Wash.: SPIE, 1977.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Developments in Semiconductor Microlithography II: [seminar], April 4-5, 1977, San Jose, California. SPIE, 1977.