X-ray lithography and applications of soft X-rays to technology : October 19-20, 1983, Upton, New York : [proceedings] /
| Corporate Authors: | , |
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| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash. :
SPIE--the International Society for Optical Engineers,
[1984]
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 448. |
| Subjects: | |
| Online Access: | https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0448.toc?SSO=1 |
| Item Description: | Includes bibliographical references and indexes. |
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| Physical Description: | vi, 140 pages : illustrations ; 28 cm. |
| ISBN: | 0892524839 (pbk.) |