Society of Photo-optical Instrumentation Engineers, National Synchrotron Light Source (Organization : U.S.), & Wilson, A. D. (1984). X-ray lithography and applications of soft X-rays to technology: October 19-20, 1983, Upton, New York : [proceedings]. SPIE--the International Society for Optical Engineers.
Chicago Style (17th ed.) CitationSociety of Photo-optical Instrumentation Engineers, National Synchrotron Light Source (Organization : U.S.), and Alan D. Wilson. X-ray Lithography and Applications of Soft X-rays to Technology: October 19-20, 1983, Upton, New York : [proceedings]. Bellingham, Wash.: SPIE--the International Society for Optical Engineers, 1984.
MLA (9th ed.) CitationSociety of Photo-optical Instrumentation Engineers, et al. X-ray Lithography and Applications of Soft X-rays to Technology: October 19-20, 1983, Upton, New York : [proceedings]. SPIE--the International Society for Optical Engineers, 1984.