Cover Image

Optical microlithography V : March 13-14, 1986, Santa Clara, California /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Stover, Harry L.
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1986]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 633.
Subjects:
Microlithography > Congresses.
Integrated circuits > Very large scale integration > Congresses.
Description
Physical Description:vi, 309 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographies and index.