Advances in resist technology and processing III : 10-11 March 1986, Santa Clara, California /
| Corporate Author: | |
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| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash., USA :
SPIE--the International Society for Optical Engineering,
[1986]
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 631. |
| Subjects: | |
| Online Access: | https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0631.toc?SSO=1 |
| Physical Description: | vi, 346 pages : illustrations ; 28 cm. |
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| Bibliography: | Includes bibliographies and index. |
| ISBN: | 0892526661 (pbk.) |