Cover Image

Developments in semiconductor microlithography : [seminar] : June 1-3, 1976, San Jose, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Northern California Microphotomask/Masking Working Group
Other Authors: Routh, Donald E.
Format: Book
Language:English
Published: Palos Verdes Estates, Calif. : SPIE, 1976.
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 80.
Subjects:
Semiconductors > Congresses.
Photolithography > Congresses.
Microelectronics > Congresses.
Description
Physical Description:vi, 146 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and indexes.
ISBN:0892521074