APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Northern California Microphotomask/Masking Working Group, & Routh, D. E. (1976). Developments in semiconductor microlithography: [seminar] : June 1-3, 1976, San Jose, California. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Northern California Microphotomask/Masking Working Group, and Donald E. Routh. Developments in Semiconductor Microlithography: [seminar] : June 1-3, 1976, San Jose, California. Palos Verdes Estates, Calif.: SPIE, 1976.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Developments in Semiconductor Microlithography: [seminar] : June 1-3, 1976, San Jose, California. SPIE, 1976.