Semiconductor microlithography VI : March 30-31, 1981, San Jose, California /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Dey, Jim
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE--The International Society for Optical Engineering, [1981]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 275.
Subjects:

MARC

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245 0 0 |a Semiconductor microlithography VI :  |b March 30-31, 1981, San Jose, California /  |c Jim Dey, editor. 
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