Semiconductor microlithography VI : March 30-31, 1981, San Jose, California /
| Corporate Author: | |
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| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Wash. :
SPIE--The International Society for Optical Engineering,
[1981]
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| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 275. |
| Subjects: |
| Physical Description: | vi, 221 pages : illustrations ; 28 cm. |
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| Bibliography: | Includes bibliographical references and indexes. |
| ISBN: | 0892523085 (pbk.) |