Society of Photo-optical Instrumentation Engineers & Dey, J. (1981). Semiconductor microlithography VI: March 30-31, 1981, San Jose, California. SPIE--The International Society for Optical Engineering.
Chicago Style (17th ed.) CitationSociety of Photo-optical Instrumentation Engineers and Jim Dey. Semiconductor Microlithography VI: March 30-31, 1981, San Jose, California. Bellingham, Wash.: SPIE--The International Society for Optical Engineering, 1981.
MLA (9th ed.) CitationSociety of Photo-optical Instrumentation Engineers and Jim Dey. Semiconductor Microlithography VI: March 30-31, 1981, San Jose, California. SPIE--The International Society for Optical Engineering, 1981.
Warning: These citations may not always be 100% accurate.