A laser triggered vacuum spark x-ray lithography source /

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California /
Published: (1992)

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California /
Published: (1989)

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California /
Published: (1990)

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California /
Published: (1988)

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California /
Published: (1995)

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California /
Published: (1996)

Multilayer and grazing incidence x-ray/EUV optics for astronomy and projection lithography : 19-22 July 1992, San Diego, California /
Published: (1993)

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California /
Published: (1993)

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California /
Published: (1994)

The Physics of Submicron Lithography /
by: Valiev, Kamil A.
Published: (1992)

EUV, X-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado /
Published: (1999)

Emerging lithographic technologies X : 21-23 February 2006, San Jose, California, USA /
Published: (2006)

Photomask and X-ray mask technology III : 18-19 April 1996, Kawasaki City, Kanagawa, Japan /
Published: (1996)

Patterning of material layers in submicron region /
by: Tandon, U. S., 1952-
Published: (1993)

X-ray optics and X-ray microanalysis /
Published: (1963)

Multilayer and grazing incidence X-ray/EUV optics III : 5-6 August, 1996, Denver, Colorado /
Published: (1996)

Emerging lithographic technologies V : 27 February-1 March 2001, Santa Clara, USA /
Published: (2001)

Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA /
Published: (2000)

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA /
Published: (2005)

Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA /
Published: (2004)

Emerging lithographic technologies VII : 25-27 February 2003, Santa Clara, California, USA /
Published: (2003)

Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California /
Published: (1999)

Emerging lithographic technologies VI : 5-7 March 2002, Santa Clara, USA /
Published: (2002)

Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA /
Published: (2007)

Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California /
Published: (1998)

Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California /
Published: (1997)

Photomask and X-ray mask technology V : 9-10 April 1998, Kawasaki, Japan /
Published: (1998)

Photomask and X-ray mask technology IV : 17-18 April 1997, Kawasaki, Japan /
Published: (1997)

X-ray optics and X-ray microanalysis
Published: (1963)

A compact electron storage ring design /
by: Swenson, Charles Allen, 1961-
Published: (1992)

15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany /
Published: (1999)

Course manual for machine sources of X-rays (GS-461).
Published: (1977)

Photomask and next-generation lithography mask technology X : 16-18 April 2003, Yokohama, Japan /
Published: (2003)

Guide for the filing of annual reports for x-ray components and systems /
Published: (1980)

Modern lithography /
by: Faux, Ian
Published: (1978)

Resists in microlithography and printing /
by: Bednář, B.
Published: (1993)